Infrastructure team 1 focuses on the methodologies and manufacturing processes for micro- and nanostructuring. This includes both optical lithography and electron beam lithography. Infrastructure team 1 supports the working groups in the production of conventional periodically poled lithium niobate and potassium titanyl phosphate devices, which are produced for conventional, integrated optical applications. In addition, nanostructures are developed and manufactured as they are applied in nanostructured circuits, for example thin-film lithium niobate and metamaterials. Another field of activity is the provision of coating techniques for dielectric and metallic layers. Furthermore, the tasks of infrastructure team 1 include the linear, nonlinear, quantum optical and electro-optical characterisation of samples at room temperature and the combination of such samples with electro-optical circuits. The infrastructure team 1 consists of three postdocs, two laboratory engineers and one technician.

Infrastructure Team 1 will provide support and maintenance for the following PhoQS equipment:

AFM, 2-photon microscope, ellipsometer and CW TiSa.

In addition, the following associated equipment is already maintained in infrastructure team 1:

Mask Lithography (IQO), Electron Beam Lithography (IQO), Profilometer Dektak (CeOPP), Dielectric Evaporation Plant Marquis (IQO), Sputtering Plant Prevac (IQO), ICP (IQO, hqpd), Evaporation Plant Winter (UNP).